• Journal of Advanced Dielectrics
  • Vol. 14, Issue 5, 2350028 (2024)
Aryan Singh Lather1,*, Kanika Poonia1, R. S. Kundu1, Neetu Ahlawat1..., Anuj Nehra1 and Shubhpreet Kaur2|Show fewer author(s)
Author Affiliations
  • 1Department of Physics, Guru Jambheshwar University of Science & Technology, Hisar 125001, Haryana, India
  • 2Department of Physics, SLIET, Sangrur 148106, Punjab, India
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    DOI: 10.1142/S2010135X23500285 Cite this Article
    Aryan Singh Lather, Kanika Poonia, R. S. Kundu, Neetu Ahlawat, Anuj Nehra, Shubhpreet Kaur. CuO:V2O5 driven alterations in dielectric, ferroelectric and structural properties of Barium Zirconate Titanate ceramics[J]. Journal of Advanced Dielectrics, 2024, 14(5): 2350028 Copy Citation Text show less

    Abstract

    This study focuses on the properties of Vanadium and Copper co-doped Barium Zirconate Titanate (BZT) for potential technological applications. Various doping ratios of CuO:V2O5 were used to synthesize the materials, and X-ray diffraction (XRD) confirmed a tetragonal phase in all samples. The grain density and dimensions decreased with higher concentrations of V2O5 and CuO. FTIR spectra confirmed the compositional structure and bonding of the samples. The impedance analysis indicated that higher doping concentrations facilitated charge conduction at grain boundaries. Dielectric relaxation was studied using the Havriliak–Negami model and electrical modulus behavior was analyzed. Activation energy values from Arrhenius fitting matched those from impedance data, suggesting the same type of charge carriers. The study revealed that elevated levels of V concentration induced charge carriers to exhibit hopping behavior, thereby enhancing conductivity. Conversely, higher Cu concentration impeded hopping, leading to a swift rise in activation energy.
    Aryan Singh Lather, Kanika Poonia, R. S. Kundu, Neetu Ahlawat, Anuj Nehra, Shubhpreet Kaur. CuO:V2O5 driven alterations in dielectric, ferroelectric and structural properties of Barium Zirconate Titanate ceramics[J]. Journal of Advanced Dielectrics, 2024, 14(5): 2350028
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