Design and Improvement of DMD Control Methods in Direct Laser Writing System

ZHANG Lin; HU Danfeng; ZHU Pengfei; PU Donglin; XU Jie; WANG Jiajun

doi:10.16818/j.issn1001-5868.2021062401

Journals >Semiconductor Optoelectronics >Volume 42 >Issue 5 >Page 741 > Article

Semiconductor Optoelectronics
Vol. 42, Issue 5, 741 (2021)

Design and Improvement of DMD Control Methods in Direct Laser Writing System

ZHANG Lin¹, HU Danfeng¹, ZHU Pengfei², PU Donglin³..., XU Jie¹ and WANG Jiajun¹|Show fewer author(s)

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¹[in Chinese]

²[in Chinese]

³[in Chinese]

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DOI: 10.16818/j.issn1001-5868.2021062401 Cite this Article

ZHANG Lin, HU Danfeng, ZHU Pengfei, PU Donglin, XU Jie, WANG Jiajun. Design and Improvement of DMD Control Methods in Direct Laser Writing System[J]. Semiconductor Optoelectronics, 2021, 42(5): 741 Copy Citation Text

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References

[1] Texas Instruments. DMD 101: Introduction to Digital Micromirror Device (DMD) Technology[EB/OL]. (2018-02)[2021-04-20]. https://www.ti.com.cn/.

[9] Li Q K, Yao X, Liu H, et al. Analysis and correction of the distortion error in a DMD based scanning lithography system[J]. Optics Commun., 2019, 434: 1-6.

[11] Peng C, Zhang Z, Zou J, et al. A high-speed exposure method for digital micromirror device based scanning maskless lithography system[J]. Optik, 2019, 185: 1036-1044.

[15] Texas Instruments. DLP7000 DLP 0.7 XGA 2x LVDS Type A DMD[EB/OL]. (2019-6)[2021-04-20]. https://www.ti.com.cn/.

[16] Xilinx. FIFO Generator v13.2 Product Guide[EB/OL]. (2017-10)[2021-04-20]. https:// china.xilinx.com/.

ZHANG Lin, HU Danfeng, ZHU Pengfei, PU Donglin, XU Jie, WANG Jiajun. Design and Improvement of DMD Control Methods in Direct Laser Writing System[J]. Semiconductor Optoelectronics, 2021, 42(5): 741

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