• Laser & Optoelectronics Progress
  • Vol. 61, Issue 18, 1837006 (2024)
Xiangtan Yu1,2,3,4, Yaohong Zhao1,2,*, and Wei Xiang1,2
Author Affiliations
  • 1Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang 110016, Liaoning , China
  • 2Key Laboratory of Opto-Electronic Information Processing, Chinese Academy of Sciences, Shenyang 110016, Liaoning , China
  • 3Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang 110169, Liaoning , China
  • 4University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/LOP232779 Cite this Article Set citation alerts
    Xiangtan Yu, Yaohong Zhao, Wei Xiang. Image Stitching Combining Enhanced Optimal Seam and Optimized Brightness[J]. Laser & Optoelectronics Progress, 2024, 61(18): 1837006 Copy Citation Text show less

    Abstract

    An image stitching algorithm that combines enhanced optimal seam and optimized brightness is proposed to address the issue of ghosting and inconsistent brightness in panoramic images arising from large parallax and exposure differences. First, a deformation model based on minimizing projection biases was used for image registration to accurately align overlapping area. Second, an enhanced optimal seam algorithm was implemented between two intersections in the overlapping area to avoid information loss in the panoramic image. Finally, leveraging the Poisson fusion image, the energy functional of the ideal panoramic image gradient and a nonuniform illumination fitting model were constructed to optimize the brightness and improve the brightness consistency of the panoramic image. Experimental results show that compared with the algorithm proposed in reference [11], the proposed algorithm improves the structural similarity by 5.58% and peak-signal-to-noise ratio by 9.55% in terms of eliminating large parallax. Compared with before optimization, the proposed algorithm reduces the average gradient of the illumination component by 14.90% and improves the average gradient by 12.09% in terms of eliminating exposure differences. Thus, the algorithm can be used for image stitching in scenes with large disparities and exposure differences.
    q^Hp^
    J=i=1κg(xi', yi')-gi2+ρ2g2dxdy
    g=i=1κUTx-pi'2lnx-pi'+BTx^
    E(x,y)=E(x,y)+minE(x-1,y-1),E(x-1,y),E(x-1,y+1)
    E(x,y)=EC(x,y)+EG(x,y)
    EC(x,y)=I1(x,y)-I2(x,y)maxI1(x,y),I2(x,y)
    EG(x,y)=G1(x,y)-G2(x,y)maxG1(x,y),G2(x,y)
    Gi(x,y)=Sx×Ii(x,y)2+Sy×Ii(x,y)2
    minFΩ1F-v2 with  F|Ω1=Iq'|Ω1
    F(x-1,y)+F(x,y-1)-4F(x,y)+ F(x,y+1)+F(x+1,y)=divv,
    F(x,y)=Iq'(x,y)
    f=ln(FI)=ln(R)+ln(L)=r+l
    R^=exp(f-l^)
    l^=arg minω(f-l1+μω1)
    l(x,y)=ωc
    c=1,x,y,x2,xy,y2
    (ω,z,s;a,b)=z1+aT(z-Cω+f)+φ12z-Cω+f2+μs1+bT(s-ω)+φ22s-ω2,
    ωk+1=arg minω(ω,zk,sk;ak,bk)zk+1=arg minz(ωk+1,z,sk;ak,bk)sk+1=arg mins(ωk+1,zk+1,s;ak,bk)
    ωk+1=φ1CT(zk+f)+φ2sk+CTak-bkφ1CTC+φ2Izk+1=shrink(Cωk-f+akφ1,1φ1)sk+1=shrink(ωk+bkφ2,μφ2)
    ak+1=ak+φ1(zk+1-Cωk+1+f)bk+1=bk+φ2(sk+1-ωk+1)
    φ1=βφ1,zk+1-Cωk+1+f2αzk-Cωk+f2φ1,otherwise
    φ2=βφ2,sk+1-ωk+12αsk-ωk2φ2,otherwise
    Xiangtan Yu, Yaohong Zhao, Wei Xiang. Image Stitching Combining Enhanced Optimal Seam and Optimized Brightness[J]. Laser & Optoelectronics Progress, 2024, 61(18): 1837006
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