Holographic Double-Sided Photolithography Based on Improved Gerchberg-Saxton Algorithm

Huabin Wang; Yu He; Lixin Zhao

doi:10.3788/LOP222978

Journals >Laser & Optoelectronics Progress >Volume 60 >Issue 16 >Page 1609001 > Article

Laser & Optoelectronics Progress
Vol. 60, Issue 16, 1609001 (2023)

Holographic Double-Sided Photolithography Based on Improved Gerchberg-Saxton Algorithm

Huabin Wang^1,2, Yu He^1,2, and Lixin Zhao^1,2,*

Author Affiliations

¹State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, Sichuan, China

²University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/LOP222978 Cite this Article Set citation alerts

Huabin Wang, Yu He, Lixin Zhao. Holographic Double-Sided Photolithography Based on Improved Gerchberg-Saxton Algorithm[J]. Laser & Optoelectronics Progress, 2023, 60(16): 1609001 Copy Citation Text

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Huabin Wang, Yu He, Lixin Zhao. Holographic Double-Sided Photolithography Based on Improved Gerchberg-Saxton Algorithm[J]. Laser & Optoelectronics Progress, 2023, 60(16): 1609001

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