• Infrared and Laser Engineering
  • Vol. 50, Issue 10, 20200489 (2021)
Tiantian Jia1, Hailiang Dong1, Zhigang Jia1, Aiqin Zhang2..., Jian Liang3 and Bingshe Xu1,4|Show fewer author(s)
Author Affiliations
  • 1Key Laboratory of Interface Science and Engineering in Advanced Materials Ministry of Education, Taiyuan University of Technology, Taiyuan 030024, China
  • 2College of Textile Engineering, Taiyuan University of Technology, Taiyuan 030024, China
  • 3College of Materials Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, China
  • 4Institute of Atomic and Molecular Science, Shaanxi University of Science & Technology, Xi’an 710021, China
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    DOI: 10.3788/IRLA20200489 Cite this Article
    Tiantian Jia, Hailiang Dong, Zhigang Jia, Aiqin Zhang, Jian Liang, Bingshe Xu. Influence of indium composition of n waveguide layer on photoelectric performance of GaN-based green laser diode[J]. Infrared and Laser Engineering, 2021, 50(10): 20200489 Copy Citation Text show less
    Epitaxial structure of the InGaN-based green laser diode
    Fig. 1. Epitaxial structure of the InGaN-based green laser diode
    Refractive index of InxGa1-xN with x composition 0.04-0.08 at the wavelength of 525 nm
    Fig. 2. Refractive index of InxGa1-xN with x composition 0.04-0.08 at the wavelength of 525 nm
    Refractive index profiles and intensity distributions of TE-modes versus the different n-InxGa1−xN waveguide indium content ((b) is the magnification of (a) from 550 nm to 1050 nm)
    Fig. 3. Refractive index profiles and intensity distributions of TE-modes versus the different n-InxGa1−xN waveguide indium content ((b) is the magnification of (a) from 550 nm to 1050 nm)
    Optical loss outside multiple quantum wells ( αout) (a), optical loss in multiple quantum wells (αQW) (b) and total optical loss (αTotal) (c) of laser diode versus the injected current for different n-InxGa1−xN waveguide indium content (The arrow indicates 0.5 A or 6 kA/cm2)
    Fig. 4. Optical loss outside multiple quantum wells ( αout) (a), optical loss in multiple quantum wells (αQW) (b) and total optical loss (αTotal) (c) of laser diode versus the injected current for different n-InxGa1−xN waveguide indium content (The arrow indicates 0.5 A or 6 kA/cm2)
    Leakage current density (a), injection efficiency (b) and IQE (c) of laser diode versus the injected current for different n-InxGa1−xN waveguide indium content
    Fig. 5. Leakage current density (a), injection efficiency (b) and IQE (c) of laser diode versus the injected current for different n-InxGa1−xN waveguide indium content
    Band energy versus of different n-InxGa1−xN waveguide indium contents at injection current 0.5 A (Injection density is 6 kA/cm2)
    Fig. 6. Band energy versus of different n-InxGa1−xN waveguide indium contents at injection current 0.5 A (Injection density is 6 kA/cm2
    [in Chinese]
    Fig. 6. [in Chinese]
    Curves of nonradiative current density (a), SRH current density (b), Auger current density (c) and active region carrier concentration (d) versus injected current at different indium components of n-InxGa1−xN waveguide layers
    Fig. 7. Curves of nonradiative current density (a), SRH current density (b), Auger current density (c) and active region carrier concentration (d) versus injected current at different indium components of n-InxGa1−xN waveguide layers
    Threshold current (a) and voltage (b) of laser diode with n-InxGa1−xN waveguide indium contents versus injected current
    Fig. 8. Threshold current (a) and voltage (b) of laser diode with n-InxGa1−xN waveguide indium contents versus injected current
    Simulated power (a) and conversion efficiency (b) of laser diode with n-InxGa1−xN waveguide indium contents versus injected current
    Fig. 9. Simulated power (a) and conversion efficiency (b) of laser diode with n-InxGa1−xN waveguide indium contents versus injected current
    NameThicknessConcentration /cm−3Mobility /cm2V−1s−1
    p-Contact layer100 nm p-GaN1×1020200/20
    p-Cladding layer (CL)500 nm p-Al0.12In0.01Ga0.87N 1×1020200/20
    p- Waveguide layer (WG) 70 nm p-In0.04Ga0.96N 2×1019200/20
    Electron blocking layer (EBL) 14nm p-Al0.18In0.01Ga0.81N 5×1018200/20
    Quantum well (QW)/ Quantum barrier (QB) (×2) 3.5 nm In0.29Ga0.71N/11 nm Al0.05In0.01Ga0.94N 0/6×10183000/30/ 200/20
    QW3.5 nm In0.29Ga0.71N 03000/30
    n-WG47.5 nm InxGa1-xN 5×1018200/20
    n-WG100 nm n-GaN5×1018200/20
    n-CL550 nm n-Al0..09In0.01Ga0.9N 6×1018200/20
    n-Contact layer100 nm n-GaN6×1018200/20
    Table 1. Structural parameters of InGaN-based green laser diode
    Tiantian Jia, Hailiang Dong, Zhigang Jia, Aiqin Zhang, Jian Liang, Bingshe Xu. Influence of indium composition of n waveguide layer on photoelectric performance of GaN-based green laser diode[J]. Infrared and Laser Engineering, 2021, 50(10): 20200489
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