There are important practical applications of high reflective films in the far-ultraviolet band. In order to obtain high reflectance, the far-ultraviolet broadband high reflective films are prepared by depositing an Al films protected by MgF₂ films with the high temperature three-step evaporation method, and these samples are annealed. The results show that the far-ultraviolet broadband high reflective films after improved preparation and annealing can possess a reflectance as high as 90% at 121.6 nm, close to the theoretical design value, and meanwhile, the effect of scattering loss is also analyzed. The narrowband reflective filter films are prepared based on the optimized LaF₃/MgF₂ film structure. The peak reflectance at central wavelength of 122.5 nm is 75% and the full width half maximum is 8 nm, which indicating the expected effect of the theoretical design has been obtained. However, the annealing process damages the film surface to induce the increase of scattering loss and the decrease of film reflectance.