Changda Zhang, Mingyou Gao, Yan Zhou, Xiaozhou Deng, Xin Xiong, Fenglei Liu, Weiguo Zhang. Preparation method of silicon-based aspheric cylindrical microlens array[J]. Infrared and Laser Engineering, 2022, 51(7): 20210688
- Infrared and Laser Engineering
- Vol. 51, Issue 7, 20210688 (2022)
Fig. 1. Silicon lens preparation process
Fig. 2. Influence of spin-coating speed on photoresist thickness and surface uniformity of adhesive layer
Fig. 3. Comparison of bubble defects on the lens surface after etching. (a) 90 ℃ constant temperature baking for single coating; (b) 22-90 ℃ gradient baking for single coating; (c) 22-90 ℃ gradient baking for secondary coating
Fig. 4. Photoresist coating experiment for multiple times
Fig. 5. Mask pattern size
Fig. 6. Surface topography after photolithography. (a) One moving exposure; (b) Cycle moving exposure
Fig. 7. Mask layout correction principle
Fig. 8. Surface morphology of Si etched by different CHF3 flow rates. (a) 20 sccm; (b) 30 sccm; (c) 40 sccm; (d) 40 sccm cyclic etching
Fig. 9. Influence of different CHF3 gas flow rate on the etching speed of silicon and photoresist
Fig. 10. Comparison of surface roughness of silicon lens. (a) Single etching; (b) Cyclic etching
Fig. 11. Large numerical aperture aspheric silicon micro cylindrical lens. (a) Real image of lens; (b) AFM; (c)-(d) SEM surface morphology; (e) Fitting diagram of effective caliber curve
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