This study presents the fabrication process of quartz microlens arrays (MLAs) using a combination of photoresist thermal reflow and plasma etching techniques. Key fabrication steps, including thermal reflow and inductively coupled plasma reactive ion etching (ICP-RIE), were investigated in detail. The optimal process parameters were determined, enabling the preparation of quartz MLAs in various sizes and shapes. The geometrical morphology and optical properties of the fabricated MLAs were evaluated, showing high uniformity and excellent surface quality. The measured focal lengths were found to be in close agreement with theoretical predictions. The results demonstrate that the fabricated MLAs exhibit excellent imaging performance, making them highly suitable for various optical applications.