[2] Moore S, Gomez J, Lek D, et al. Experimental study of polymer microlens fabrication using partial-filling hot embossing technique[J]. Microelectron. Eng., 2016, 162: 57-62.
[3] Yang H, Chao C K, Wei M K, et al. High fill-factor microlens array mold insert fabrication using a thermal reflow process[J]. J. Micromech. Microeng., 2004, 14(8): 1197-1204.
[4] Ong N S, Koh Y H, Fu Y Q. Microlens array produced using hot embossing process[J]. Microelectron. Eng., 2002, 60(3): 365-379.
[6] Zhou X J, Song A G, Wang S, et al. Fabrication of refractive silicon microlens array with a large focal number and accurate lens profile[J]. Microsyst. Technol., 2019, 26(4): 1159-1166.
[8] Yang J J, Liao Y S, Chen C F, et al. Fabrication of long hexagonal micro-lens array by applying gray-scale lithography in micro-replication process[J]. Opt. Commun., 2007, 270(2): 433-440.
[9] Roy E, Voisin B, Gravel J F, et al. Microlens array fabrication by enhanced thermal reflow process: Towards efficient collection of fluorescence light from microarrays[J]. Microelectron. Eng., 2009, 86(11): 2255-2261.
[10] Ottevaere H, Thienpont H, Cox R, et al. Comparing glass and plastic refractive microlenses fabricated with different technologies[J]. J. Opt. A: Pure Appl. Opt., 2006, 8(7): 407-429.
[11] Nussbaum Ph, Vlkel R, Herzig P, et al. Design, fabrication and testing of microlens arrays for sensors and microsystems[J]. J. Eur. Opt. Soc. Part A, 1997, 6(6): 617-636.
[12] Vlkel R, Herzig H P, Nussbaum Ph, et al. Microlens lithography: A new approach for large display fabrication[J]. Microelectron. Eng., 1996, 30(1/4): 107-110.
[13] Arai J, Kawai H, Okano F. Microlens arrays for integral imaging system[J]. Appl. Opt., 2006, 45(36): 9066-9078.
[14] Liu D, Wu L Y, Liu M, et al. Study on the surface topography changes of photoresist in the design and fabrication of microlens array[J]. Opt. Eng., 2024, 63(3): 034105.
[15] Rubico J T, Stern M B, Knowlden R E. Effect of refractive microlens array fabrication parameters on optical quality[J]. Proc. of SPIE, 1993, 1751: 236-245.
[16] Nojiri K. Dry Etching Technology for Semiconductors[M]. London: Springer International AG, 2014: 39-41.
[17] Leech P W. Reactive ion etching of quartz and silica-based glasses in CF4/CHF3 plasmas[J]. Vacuum, 1999, 55(3/4): 191-196.
