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    Journals >Infrared and Laser Engineering >Volume 30 >Issue 1 >Page 66 > Article
    • Infrared and Laser Engineering
    • Vol. 30, Issue 1, 66 (2001)
    Study on the formation mechanism of PtSi film by X-ray diffraction and X-ray photo spectrum
    1,*, 1, 1, 2, and 2
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  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on the formation mechanism of PtSi film by X-ray diffraction and X-ray photo spectrum[J]. Infrared and Laser Engineering, 2001, 30(1): 66 Copy Citation Text show less

    Abstract

    It is very important forformation of PtSi thin film to make the phases of thin film change into Pt

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on the formation mechanism of PtSi film by X-ray diffraction and X-ray photo spectrum[J]. Infrared and Laser Engineering, 2001, 30(1): 66
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