Yi-Tian CHENG, Wan-Qi QIU, Ke-Song ZHOU, Zhong-Wu LIU, Dong-Ling JIAO, Xi-Chun ZHONG, Hui ZHANG. Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering Al+α-Al2O3 Target [J]. Journal of Inorganic Materials, 2019, 34(8): 862
- Journal of Inorganic Materials
- Vol. 34, Issue 8, 862 (2019)
1. Schematic diagram of the experimental setup of Radio Frequency (RF) magnetron sputtering system
2. GIXRD patterns of the films deposited at 550 ℃ from Al target and α -Al2O3 target
3. GIXRD patterns of the film deposited at 550 ℃ from α -Al2O3 target and Al+α -Al2O3 composite target
4. GIXRD pattern of the film deposited from Al+α -Al2O3 composite target at 500 ℃
5. TEM micrographs of the films deposited at 500 ℃from (a) α -Al2O3 and (b) Al+α -Al2O3 composite targets
6. (a) P-h curves and (b) Hardness of the alumina films deposited from different targets at 550 ℃
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Table 1. The elementary compositions of the films deposited at 550 ℃ from various targets
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