• Optoelectronic Technology
  • Vol. 43, Issue 3, 212 (2023)
Yifeng LIU1,2, Junyang NIE4, Kaixin ZHANG1,2, Chang LIN1,2..., Min LI2, Qun YAN1,2,5 and Jie SUN1,2,3|Show fewer author(s)
Author Affiliations
  • 1National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, and Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 35000, CHN
  • 2Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China,Fuzhou 350100, CHN
  • 3Quantum Device Physics Laboratory, Chalmers University of Technology, Göteborg41296, Sweden
  • 4Faculty of Electronic and Information Engineering, Xi’an Jiaotong University, Xi’an71009, CHN
  • 5Rich Sense Electronics Technology Co., Ltd., Quanzhou Fujian 362200, CHN
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    DOI: 10.19453/j.cnki.1005-488x.2023.03.005 Cite this Article
    Yifeng LIU, Junyang NIE, Kaixin ZHANG, Chang LIN, Min LI, Qun YAN, Jie SUN. Liquid Deposition Method of Hafnium Oxide Thin Films[J]. Optoelectronic Technology, 2023, 43(3): 212 Copy Citation Text show less
    Process flow chart for preparing thin HfO2 films by the liquid deposition method
    Fig. 1. Process flow chart for preparing thin HfO2 films by the liquid deposition method
    The change of growth solution standing for 6 hours and Tyndall phenomenon
    Fig. 2. The change of growth solution standing for 6 hours and Tyndall phenomenon
    The SEM images of the three HfO2 thin films
    Fig. 3. The SEM images of the three HfO2 thin films
    Elemental composition analysis of HfO2 films
    Fig. 4. Elemental composition analysis of HfO2 films
    Performance test of HfO2 thin films
    Fig. 5. Performance test of HfO2 thin films