• Infrared and Laser Engineering
  • Vol. 53, Issue 10, 20240243 (2024)
Shupei JIN, Yunong HU, Peng ZHOU, and Ming LIU
Author Affiliations
  • North China Research Institute of Electro-Optics, Beijing 100015, China
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    DOI: 10.3788/IRLA20240243 Cite this Article
    Shupei JIN, Yunong HU, Peng ZHOU, Ming LIU. Study on the electrical properties of superlattice influenced by the thickness of GaSb substrate[J]. Infrared and Laser Engineering, 2024, 53(10): 20240243 Copy Citation Text show less
    Hall effect diagram
    Fig. 1. Hall effect diagram
    Diagram of a thin film sample for Hall test
    Fig. 2. Diagram of a thin film sample for Hall test
    Schematic diagram of the growing system of MBE
    Fig. 3. Schematic diagram of the growing system of MBE
    Structure diagram of mechano chemical polishing
    Fig. 4. Structure diagram of mechano chemical polishing
    Structure diagram of n doped InAs/GaSb type Ⅱ superlattice film
    Fig. 5. Structure diagram of n doped InAs/GaSb type Ⅱ superlattice film
    Structure diagram of p doped InAs/GaSb type Ⅱ superlattice film
    Fig. 6. Structure diagram of p doped InAs/GaSb type Ⅱ superlattice film
    (a) The electrical characteristics of n doped InAs/GaSb type Ⅱ superlattice film, it indicates that the change of carrier concentration with different thinkness of GaSb substrate; (b) The electrical characteristics of n doped InAs/GaSb type Ⅱ superlattice film, it is the change of mobility with different thinkness of GaSb substrate
    Fig. 7. (a) The electrical characteristics of n doped InAs/GaSb type Ⅱ superlattice film, it indicates that the change of carrier concentration with different thinkness of GaSb substrate; (b) The electrical characteristics of n doped InAs/GaSb type Ⅱ superlattice film, it is the change of mobility with different thinkness of GaSb substrate
    The electrical characteristics of p doped InAs/GaSb type Ⅱ superlattice film. (a) indicates that the change of carrier concentration with different thinkness of GaSb substrate; (b) is the change of mobility with different thinkness of GaSb substrate
    Fig. 8. The electrical characteristics of p doped InAs/GaSb type Ⅱ superlattice film. (a) indicates that the change of carrier concentration with different thinkness of GaSb substrate; (b) is the change of mobility with different thinkness of GaSb substrate
    GaSb thickness/μmCarrier typeCarrier concentration/cm−3Mobility/ cm2·V−1·s−1
    606n1.7201×10161.0585×104
    306n1.5016×10161.2664×104
    206n1.4205×10161.2805×104
    120n1.3687×10161.2796×104
    Table 1. Hall test results of n doped InAs/GaSb type Ⅱ superlattice film with different thinkness of GaSb substrate
    GaSb thickness/μmCarrier typeCarrier concentration/ cm−3Mobility/ cm2·V−1·s−1
    606p5.3391×10162074.1
    306p4.5341×10162273.2
    206p4.4628×10162287.8
    120p4.1900×10162230.0
    Table 2. Hall test results of p doped InAs/GaSb type Ⅱ superlattice film with different thinkness of GaSb substrate
    Shupei JIN, Yunong HU, Peng ZHOU, Ming LIU. Study on the electrical properties of superlattice influenced by the thickness of GaSb substrate[J]. Infrared and Laser Engineering, 2024, 53(10): 20240243
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