We present a unified electromagnetic modeling of coherence scanning interferometry, confocal microscopy, and focus variation microscopy as the most common techniques for surface topography inspection with micro- and nanometer resolution. The model aims at analyzing the instrument response and predicting systematic deviations. Since the main focus lies on the modeling of the microscopes, the light–surface interaction is considered, based on the Kirchhoff approximation extended to vectorial imaging theory. However, it can be replaced by rigorous methods without changing the microscope model. We demonstrate that all of the measuring instruments mentioned above can be modeled using the same theory with some adaption to the respective instrument. For validation, simulated results are confirmed by comparison with measurement results.